biased dc sputtering

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• High Power Impulse Magnetron Sputtering — (HIPIMS, also known as High Impact Power Magnetron Sputtering and High Power Pulsed Magnetron Sputtering, HPPMS) is a method for physical vapor deposition of thin films which is based on magnetron sputter deposition. HIPIMS utilises extremely… …   Wikipedia

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• Static secondary ion mass spectrometry — Static secondary ion mass spectrometry, or static SIMS is a technique for chemical analysis including elemental composition and chemical structure of the uppermost atomic or molecular layer of a solid which may be a metal, semiconductor or… …   Wikipedia

• Resputtering — involves re emission of material, e.g., SiO2, deposited by sputtering during the deposition. Similar to sputtering, the re emission is caused by ion bombardment of the deposited material. The resputtering technique was first published by L.I.… …   Wikipedia

• Capacitively coupled plasma — A capacitively coupled plasma (CCP) is one of the most common types of industrial plasma sources. It essentially consists of two metal electrodes separated by a small distance, placed in a reactor. The gas pressure in the reactor can be lower… …   Wikipedia

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